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MPECVD Manual

By Yolanda Ward,2014-03-01 20:28
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MPECVD Manual

    MPECVD-R2.0 SYSTEM

    # 601 Dongyoung-Venturestel,

    172 Ojeon-dong, Uiwang-si, Guynggi-do 437-820, Korea TEL) 82-31-457-5615 FAX) 82-31-457-5629 http://www.woosinent.co.kr

    Woosin CryoVac MPECVD-R2.0

    Microwave Plasma-enhanced

    Chemical Vapor Deposition system

    Research 2.0

    MPECVD-Manual -2-

    SYSTEM Requirement Check Sheet

    1. Installation space 2000W X 2200D X 2100H 2. Main power 3Phase 220V 60Hz 30A

    2Pressure 3kg/cm 3. Cooling

     water In/out fitting 12 mm tube 4.Compressed 2Pressure 5 kg/cm (Pneumatic operation) air

    Tube 1/4″sus tube(SUS316L) 5. Gas line Input fitting 1/4″swagelock

    Gas output Regulator 2stage 1/4″swagelock fitting

    N2

    O2

    CH4 6. Operating Gases

    Etc (Ar, H2, C2H2)

    MPECVD-Manual -3-

    CONTENTS

    1 General Information

    1.1 Introduction

    1.2 Safety Information

    1.3 System Configurations / Specifications

    1.3.1 System schematic 系统原理

    1.3.2 System Requirements系统要求

    1.3.2.1 Electrical Requirements电气要求

    1.3.2.2 Working Gas

    1.3.2.3 Cooling Water

    1.3.3 Microwave Generator

    1.3.3.1 Power Supply

    1.3.3.2 3 stub tuner 3个微波协调器

    1.3.3.3 Isolator and Circulator隔离器和循环器

    1.3.3.4 Microwave Generator Head 1.3.4 DC Power Supply直流电源供应

    1.3.5 Vacuum Pumping

    1.3.6 Vacuum Gauge Sensor 1.3.7 Chamber

    1.3.8 Heater Stage

    1.3.9 Gas Control Unit

    2 Installation and System Set-up安装和系统设置

    2.1 Unpacking

    2.2 Magnetron head, Tuner and Source Connection磁控头 调谐器

    源接头

    2.3 Main Power Line

    2.4 Pneumatic Line气动管路

    2.5 Cooling Line

    2.6 Heating Stage

    2.7 Pump Line

    2.8 How to adjust Water & Air Sensor

    3 Short Course Instruction of System Operation

    3.1 Power Controller Function and Display电源控制器及显示功能

    MPECVD-Manual -4-

    3.1.1 System Controller

    3.1.1.1 Overview

    3.1.1.2 Touch Panel

    3.1.2 Heater Controller

    3.1.2.1 Overview

    3.1.2.2 Front Panel

    3.1.2.3 Rear panel

    3.2 System Operation

    3.2.1 Overview

    3.2.2 Preparation

    3.2.3 Microwave CVD Start

    3.2.4 DC Power Supply

    3.2.5 System Shutdown

4 Schematics of Vacuum System 真空系统的原理图

    5 Schematics of Electric Circuit

    6 Trouble Shooting and Maintenance常见故障排除及维护

    6.1 Vacuum Leak

    6.2 Microwave Leak

    6.3 Replacement of Microwave source quartz tube

    6.4 Replacement of Heater source

7 Appendix

    7.1 Spare parts备用配件

    7.2 Service Procedure

    7.3 Limited Warranty保修

8 Details of main Components (Reference Manual)

    MPECVD-Manual -5-

    1. General Information

1.1 Introduction

    Chemical Vapor Deposition or CVD is a broad class of processes using controlled chemical reactions to create layers on substrates. CVD involves the formation of a solid film on a heated substrate surface by means of a chemical reaction in a gas or in the vapor phase. This process employs various gaseous, liquid and solid chemicals as sources of the elements of which the thin film is to be made. In comparison with most thin film preparation methods, CVD has a number of unique advantages such as the versatility用途广泛, adaptability适应性, compatibility兼容性, quality, simplicity, re-

    productivity, productivity, and cheapness. For these reasons, CVD has expanded continuously and developed into the most important method for producing films for solid-state devices. CVDs are classified by AP (Atmosphere Pressure) CVD, LP (low pressure)

    CVD, PE(plasma enhanced) CVD, MO (Metal Organic有机金属) CVD.

    MPECVD-RA which using PECVD technique takes advantage of the high energy electrons present in glow discharges to dissociate and ionize gaseous molecules, thus generating chemically active radicals and ions. Hence, PECVD can be performed under relatively low temperature. To make or maintain a chemical reaction and using Microwave or RF-enhanced glow discharge, PECVD forms a film by conveying energy to reacting gas. Compared with the APCVD or LPCVD production process, this process lets you operate at low temperatures and also has the advantage that the depositional speed is fast.

    Application 应用

    - Surface activation

    - Carbon Nanotube

    - Diamond Growing

    - Decomposition or synthesis of gases 分解与合成气体

    - Deposition of layers

    - Plasma polymerization等离子聚合

    - Plasma cleaning of surface

    - Plasma etching, etc

    MPECVD-Manual -6-

    1.2 Safety Information

1.2.1 Overview

    Important:

    ? Please read this manual and safety information in all related manuals before

    installing or using the instrument.

    ? The safety notes and regulations given in this and related documentation have to

    be observed at all time.

    ? Check for correct main voltage before connecting any equipment.

     Warning: Lethal Voltages!

    ? Adjustments and fault finding operation may only be carried out by authorized

    personnel qualified to handle lethal voltages.

    ? Lethal voltage may be present at parts of microwave generator/component itself

    during operation.

     Always

    ? All the connectors which were originally supplied with fixing screws must always be used with their fixing screws attached and tightly secured.

    ? Leave it for a few minute after switching off for any stored energy to discharge.

    MPECVD-Manual -7-

     Interlock

    ? Cooling water: The water pressure switch is interlocked to avoid break-down of the

    vacuum chamber and Magnetron. If the water pressure is low or stop, buzzer is

    operated, and then the microwave generator power is down.

    ? Ultimate vacuum pressure: The microwave generator was not operated when the

    pressure is lower than setting ultimate pressure

    ? Vent valve: The vent valve is not opened when the V6(main gas inlet valve) valve is

     open

1.2.2 Microwave Radiation

    No ionizing radiation is electromagnetic radiation that does not disrupt the

    chemical bonds in biological molecules. The electromagnetic frequencies

    that produce photon energy of less than 0.1 electron volts, and hence are

    called no ionizing, are those frequencies below roughly 2.45Ghz. For

    reference this is just above the ultraviolet frequencies.

1.2.3 High Voltage

    - Danger: High Voltage 5kV in inside the microwave Generator, Power Head

    and the HV cable

    - Danger: High Voltage 2.0kV in DC power supply.

    MPECVD-Manual -8-

    1.3 System Configurations / Specifications

    1.3.1 System schematic

    < Front View > < Side View >

    N o Controller Name

    1 Microwave Power Generator Alter TM020

    2 DC Power Supply

    MPECVD-Manual -9-

1.3.2 System Requirements

    1.3.2.1 Electrical requirements

     Specifications

     Voltage 220VAC

    Frequency 60/50Hz

    Phase 3Phase

    Current 30Amperes 1.3.2.2 Working gas

    Channel Ch1 Ch2 Ch3 Ch4,Ch5

     O CH4 SPARE Gas H22

    SCCM

    standard-state Units SCCM SCCM SCCM cubic

    centimeter per

    minute, Range 500 10 50

     Gas inlet port: 1/4″ Swagelock fitting or VCR

1.3.2.3 Cooling Water

    2- 3kg/cm Microwave CVD operation

    - Water in/out port: 12mm one touch fitting

1.3.3 Microwave Generator

    1.3.3.1 Power Supply

    Specifications

    Input Power 208VAC 1phase

    Out power 2.0kW

    Frequency 2.54GHz

    Current 30Amperes

    Size 19" X 7"

    Weight 46 lb

    MPECVD-Manual -10-

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